Equimonet · Source-linked explainer

Samsung and ASML Expand High NA EUV Collaboration Around 12-Inch Masks

Samsung will join work on next-generation 12-inch photomask technology and plans to introduce ASML’s High NA EUV in future DRAM high-volume manufacturing by 2028.

By Equimonet Research Desk · Published 2026-09-08

Evidence frame

Based on the dated Samsung Newsroom announcement linked below. Company statements are not independently verified outcomes. General information, no recommendation. Full article text was supplied through the issuer’s own RSS feed.

Primary sources

  1. Samsung Newsroom — Samsung Electronics and ASML Expand Strategic Collaboration for Next-Generation Semiconductor Manufacturing Issued 2026-09-08T15:03:00.000Z
  2. Samsung Newsroom — first-party full-text feed Issued 2026-09-08T15:03:00.000Z

General market information only. No investment recommendation.